| 摘要 |
PURPOSE:To improve the accuracy of alignment by a method wherein a mask for forming a source/drain diffused layer is used as a reference, a plurality of alignment patterns are formed in this mask, and subsequent mask patterns are superposed on the alignment patterns. CONSTITUTION:A means is adopted wherein a pattern as show in Fig. b' is superposed on a pattern formed as shown in Fig. a'. Moreover, a different shape is given for each mask alignment as patterns 1-8 of Figs. (a)-(d) so that positions of superposition can be discriminated distinctly according to shapes in a mask alignment process. These patterns 1-8 enables not only the mask alignment according to the outer side of a pattern, but also the mask alignment according to the inner side thereof, thus facilitating an operation for mask alignment and improving the accuracy of alignment. |
