| 摘要 |
PURPOSE:To stably form a thin gamma-Fe2O3 film having excellent magnetic characteristics by depositing the thin alpha-Fed2O3 film on a disk-shaped nonmagnetic base, then subjecting the film to a reduction heat treatment to form a thin underlying Fe2O3 film. CONSTITUTION:The thin underlying film 5 formed by subjecting the thin alpha-Fe2O3 film 4 to the reduction heat treatment is preliminarily deposited on the disk- shaped nonmagnetic base 1 and the thin Fe2O4 film 6 is formed by reactive sputtering on the thin underlying film 5, by which the influence of the substrate surface can be eliminated. Since the thin Fed3O4 film 6 of the 2nd layer is formed in the form of retaining the crystallinity of the thin Fe2O3 film 5 of the 1st layer which is the underlying film, the control margin of the reactive sputtering is expanded. The thin gamma-Fed2O3 film 7 having the good magnetic characteristics can be stably formed by subjecting such thin Fed3O4 film to a heat treatment in the atmosphere.
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