| 摘要 |
PURPOSE:To eliminate the sagging of the shoulder and the wall for a soft magnetic body and to improve the propagating characteristic of a magnetic bubble by forming a mask for ion milling processing with a uniform thickness with the membrane of a substance capable of selecting etching on a soft magnetic substance layer. CONSTITUTION:On a soft magnetic substance layer 20, an SIO2 film, in which the membrane thickness is uniform and a selecting etching can be executed without damaging the layer 20, is adhered as a mask forming film 6 with a sputtering method, and the resist membrane 5 of a photosensitive resin is coated. Next, a resist pattern 51 is formed on the film 6 with a photolithography technics, the SIO2 film is etched by the reactive ion etching of a gaseous fluoride, and a mask 61 for ion milling processing is formed. Further, a resist pattern 51 is removed by an organic solvent such as acetone, the exposing parts of the mask 61 and the layer 20 are ground by the ion milling processing, and soft magnetic substance patterns 21, 22 and 23 are formed.
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