发明名称 |
Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure |
摘要 |
A process for manufacturing a mask for use in X-ray photolithography begins with a step of providing a glass disk (50) which is coated with a layer of boron nitride (52). The glass disk is about 1/4 of an inch thick and about 4.5 to 6 inches in diameter. A circular portion (50a) of the boron nitride layer on one side of the glass disk is removed thus exposing a circular portion of the glass disk. The exposed portion of the glass disk is then removed, leaving a glass ring coated with a boron nitride membrane on one side. A layer of polyimide (54) and a layer of x-ray opaque substance (58) is deposited on the boron nitride membrane. The x-ray opaque substance is then patterned, the resulting structure being a mask which is used in X-ray photolithography.
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申请公布号 |
US4708919(A) |
申请公布日期 |
1987.11.24 |
申请号 |
US19850761998 |
申请日期 |
1985.08.02 |
申请人 |
MICRONIX CORPORATION |
发明人 |
SHIMKUNAS, ALEXANDER R.;LABRIE, JAMES J. |
分类号 |
G03F1/00;G03F1/14;G03F1/16;H01L21/027;(IPC1-7):G03F9/00;G03C5/00;G21K5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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