| 摘要 |
PURPOSE:To obtain a cuticle polishing material enabling the effective administration of a high-molecular weight drug by iontophoresis, by using hard fine particles as active component and supporting the component on a flexible substrate. CONSTITUTION:Hard fine particles or powder having average diameter of about 10-100mum such as diamond, corundum, emery, silicon carbide, boron carbide, iron oxide, etc., are blasted toward or applied to the surface of a flexible substrate such as fiber, sponge, etc., to obtain the objective cuticle polishing material. When the surface of skin is rubbed with said polishing material several times, microcracks are formed on the cuticle layer without causing irritation and the drug-delivering performance can be further improved.
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