| 摘要 |
A step-and-repeat type exposure apparatus for photoprinting patterns on different portions of a workpiece, for the manufacture of a large-size pattern to be used in a panel display device, for example. Plural masks having respective patterns are used and, each time the pattern of one of the masks is transferred onto corresponding one of the portions of the workpiece, the workpiece is displaced while, on the other hand, the used mask is replaced by a subsequent mask. For the exposure of a first one of the portions of the workpiece, the first portion is aligned with a corresponding first mask, set at a reference position, by use of alignment marks provided on the first portion and the first mask. In regard to the exposure of a second one of the portions of the workpiece, the workpiece is moved while monitoring the position thereof by use of a laser interferometer, so that the second portion is brought into alignment with a second mask placed at the reference position.
|
