发明名称 PROCESSOR FOR DEVELOMENT OF SEMICONDUCTOR MATERIAL
摘要 PURPOSE:To prevent the developer from being wasted by a method wherein a valve is provided in a channel to stop the communication of developer while a ring in diameter larger than that of a wafer to be processed is provided on the head of a vessel to temporarily store the developer lifted up to the head. CONSTITUTION:A ring 3 in diameter larger than that of a wafer to be processed is provided to contain the wafer in the ring 3. The wafer S held on the back surface of a chuck 2 is approached to the head 1a of a vessel 1 to open solenoid valve 4 in a channel 1b simultaneously or almost simultaneously for lifting developer up to the head 1a and when the ring 3 is filled with the developer, the valve 4 is closed but kept open to store the developer while the wafer S is being developed. With the developement finished, another solenoid valve 6 in an exhaust channel 5 is opened simultaneously flowing water or air into an aspirator 7 to drain the developer stored above the head 1a of vessel 1 through the exhaust channel 5. Through these procedures, the developer can be prevented from being wasted.
申请公布号 JPS62269316(A) 申请公布日期 1987.11.21
申请号 JP19860114448 申请日期 1986.05.19
申请人 KUROTANI IWAO 发明人 SOGO SEIICHIRO
分类号 G03F7/30;G03F7/00;G03F7/20;H01L21/00;H01L21/027;H01L21/30 主分类号 G03F7/30
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