发明名称 VERTICAL PLASMA PROCESSOR
摘要 PURPOSE:To cut down the downtime of device by means of vertically providing a reactive chamber detachably to be turned sideways. CONSTITUTION:To clean up a reaction chamber 3, flanges 6, 7 connected to the other flanges 5, 5 on upper and lower ends of the reaction chamber 3 are removed and then a heating furnace 4 and the reaction chamber 3 are pulled out of a device along rails 31, 31; an alignment pin 27 is pulled out of a throughhole 25c to turn the heating furnace 4; and the alignment pin 27 is inserted into either one of the other throughholes 25a, 25b and 25d. The heating furnace 4 and the reaction chamber 3 being leveled by inserting the alignment pin 27 into the throughholes 25a, 25d, a level carrier can be made adjacent to the outside of reaction chamber end to pull out the reaction chamber 3 on the carrier. Through these procedures, the downtime of device can be cut down.
申请公布号 JPS62269317(A) 申请公布日期 1987.11.21
申请号 JP19860114380 申请日期 1986.05.19
申请人 PLASMA HAITETSUKU:KK 发明人 KUDO DAIJIRO;YAMAGUCHI SUSUMU;OGINO SEIICHI;ASAHA TAKASHI
分类号 H01L21/205;C23C16/50;C23F4/00;H01L21/22;H01L21/302;H01L21/3065 主分类号 H01L21/205
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