发明名称 METHOD FOR CONTROLLING EXTENT OF EVAPORATION IN VACUUM DEPOSITION APPARATUS
摘要 PURPOSE:To ensure high response to a change in the extent of evaporation by a rapid change of a shutter by comparing the opening degree of the shutter placed at the outlet of an evaporation tank with a standard and by changing the power of a heater when the difference exceeds the permitted limit. CONSTITUTION:The opening degree of a shutter 8 for regulating the feed of metallic vapor 3 generated from a metallic bath 1 is measured. When the difference between the measured value and a prescribed value is within the permitted limit, the bath 1 is continuously heated with a heater 4. When the difference is positive and is above the permitted difference, the temp. of the bath 1 is lower, so the power of the heater 4 is increased to raise the temp. of the bath 1. When the difference is negative and is below the permitted difference, the temp. of the bath 1 is higher, so the power of the heater 4 is reduced to drop the temp. of the bath 1. Thus, the instantaneous control of the extent of evaporation with the shutter is continuously carried out.
申请公布号 JPS62267471(A) 申请公布日期 1987.11.20
申请号 JP19860110554 申请日期 1986.05.16
申请人 MITSUBISHI HEAVY IND LTD;NISSHIN STEEL CO LTD 发明人 TAUCHI KUNIAKI;SEKIGUCHI YASUAKI;OHASHI KYOSUKE;HANADA TOSHIAKI
分类号 C23C14/26;C23C14/54 主分类号 C23C14/26
代理机构 代理人
主权项
地址