发明名称 X-RAY TAKEOFF DEVICE FOR PLASMA X-RAY SOURCE
摘要 PURPOSE:To enable only X-rays produced out of plasma to be stably taken out, by spraying gas between an X-ray takeoff aperture taking out these X-rays produced out of the plasma to the outside of a vessel and a plasma formation and forming a gas agglomerate there. CONSTITUTION:The inside of a vessel 13 is exhausted up to the specified pressure by an exhauster 19 and then a valve 16 is operated by a signal out of a controller 17. That is to say, a piston 161 is operated by dint of solenoid force of a coil 163, spraying gas from a gas injection port 164, and a gas agglomerate 15 pf hydrogen, helium or the like is formed in a diffusion preventing pipe 18. Immediately after that, a plsma forming power source 111 is operated by the controller 17, forming plasma there, thus X-rays are produced. With this constitution, these X-rays 12 produced out of the plasma pass through the gas agglomerate 15 and an X-ray takeoff aperture 14 and are taken out to the outside of the vessel 13, and a pattern of an X-ray mask is transferred to a wafer 21.
申请公布号 JPS62268048(A) 申请公布日期 1987.11.20
申请号 JP19860108400 申请日期 1986.05.13
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 OKADA IKUO;SAITO YASUNAO;ITABASHI SEIICHI;YOSHIHARA HIDEO
分类号 H05G2/00;G03F7/20;H01J35/18;H01J35/22;H01L21/027;H01L21/30;H05G1/00 主分类号 H05G2/00
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