| 发明名称 |
PLASMA DEPOSITION PROCESS |
| 摘要 |
<p>Dense layers of metals and compounds may be formed on a receiving surface of simple geometry by use of a plasma spray technique in a vacuum chamber in which multiple guns are used simultaneously to deposit material in overlapping areas.</p> |
| 申请公布号 |
GB2190103(A) |
申请公布日期 |
1987.11.11 |
| 申请号 |
GB19870010285 |
申请日期 |
1987.04.30 |
| 申请人 |
* GENERAL ELECTRIC COMPANY |
发明人 |
JOHN RUEL * RAIRDEN III |
| 分类号 |
C23C4/06;C23C4/12;(IPC1-7):C23C4/12 |
主分类号 |
C23C4/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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