发明名称 STRUCTURAL MATERIAL WITH SIC FILM
摘要 PURPOSE:To improve the thermal impactness, mechanical strength and workability of a structural material by constructing an SiC film by laminating layers of 10mum or thinner. CONSTITUTION:An SiC film 2 is formed by a vapor phase method on the surface of a base material 1. The film 2 is constructed by laminating 10mum or thinner layers. SiC crystal for forming the film 2 is preferably columnar crystal particularly extending in the thicknesswise direction of the film and preferably having high orientation with large columnar crystal. Since the film 2 is composed by laminating thin layers in an extremely finely banded structure, it has high distortion absorbing capacity similarly to fine crystal grain. Thus, thermal cycle resistance and thermal impact resistance are improved, mechanical strength is, though columnar crystal, remarkably high, extremely fine workability is provided preferably.
申请公布号 JPS62259430(A) 申请公布日期 1987.11.11
申请号 JP19860102654 申请日期 1986.05.02
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 KAYANE MIHARU;EBATA MAKOTO;MIYAZAKI KAZUAKI;FUJITA FUSAO
分类号 H01L21/205;C04B41/87;C23C16/32 主分类号 H01L21/205
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