发明名称 Apparatus for forming thin film.
摘要 <p>The present invention is directed to a method for forming a thin film by the use of a glow discharge plasma which comprises generating a magnetic field in a direction crossing an electric field for discharge at right angles and fluctuating the magnetic field; and the present invention is also directed to an apparatus for practicing the above method, which apparatus is composed of a reaction vessel, a means for permitting the pressure reduction in the reaction vessel and the feed of reaction gases thereto, electrodes for discharge disposed face to face in the reaction vessel, a power source from which a voltage for glow discharge is fed to the electrodes for discharge, a coil, surrounding the electrodes for discharge, for generating a magnetic field in a direction crossing at right angles an electric field generated between the electrodes for discharge, and an AC power source from which a current for magnetic field generation is fed to the coil, whereby the thin film is formed on a base plate supported outside the range of the discharge electric field and in parallel with the direction of the electric field.</p>
申请公布号 EP0244842(A2) 申请公布日期 1987.11.11
申请号 EP19870106535 申请日期 1987.05.06
申请人 MITSUBISHI JUKOGYO KABUSHIKI KAISHA 发明人 MURATA, MASAYOSHI C/O NAGASAKI TECHNICAL INSTITUTE;YAMAMOTO, TAKASHI C/O NAGASAKI TECHNICAL INSTITUTE;KAYUMI, YOSHIO C/O NAGASAKI TECHNICAL INSTITUTE;KANEKO, SHOZO C/O NAGASAKI SHIPYARD & ENGINE WORKS;GENGO, TADASHI C/O NAGASAKI SHIPYARD & ENGINE WKS.;ICHINARI, JOJI C/O NAGASAKI SHIPYARD & ENGINE WKS.;FUJIYAMA, HIROSHI 53-131, MINEGO
分类号 C23C16/517;H01L21/205 主分类号 C23C16/517
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