发明名称 ION IMPLANTATION TYPE MAGNETIC BUBBLE ELEMENT
摘要 PURPOSE:To eliminate the change in the characteristic of bubble holding region by ion implantation by forming a magnetic garnet film so as to have a partially decreased thickness and subjecting said region to deep ion implantation to form an intra-surface magnetized region. CONSTITUTION:The magnetic garnet film 1 formed on a nonmagnetic garnet substrate 2 is partly thinly formed. The region is thereafter subjected to the deep ion implantation to the extent that the ions arrive at the substrate 2 to form the intra-surface magnetized region 3. A charged wall 4 is generated by impressing an intra-surface magnetic field to said region and a magnetic bubble can be driven by the magnetic pole of the charged wall. Since the ions are not implanted to the region where the magnetic bubble 5 exists according to such element constitution, the instability of the bubble is obviated.
申请公布号 JPS62259289(A) 申请公布日期 1987.11.11
申请号 JP19860102026 申请日期 1986.05.06
申请人 HITACHI LTD 发明人 HOSOE YUZURU;ANDO KEIKICHI;IKEDA HITOSHI;SUZUKI MAKOTO
分类号 G11C11/14;G11C19/08 主分类号 G11C11/14
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