| 摘要 |
PURPOSE:To inhibit the generation of wall deposition by supplying the internal space of a hollow inverted truncated supporter with a reaction gas, forming a vapor growth layer on the surface of a body to be treated heated through the supporter by a heat source and discharging the reaction gas. CONSTITUTION:A reaction cylinder 3 is installed onto a base plate l, and a rotating carriage 10 is mounted concentrically to the reaction cylinder 3. A central inverted truncated supporter 14 is set up onto the rotating carriage 10, and bodies to be treated 16 are set to the inside of the supporter 14. A plurality of nozzles 22 supplying a reaction gas are fitted to a ring 5 installed to the upper section of the reaction cylinder 3, and the noses of the nozzles 22 are bent downward and the reaction gas is caused to flow along the inner side surfaces of a flow straightener 21 and the supporter 14. A heat source 27 consisting of lamps 25 and a reflecting plate 26 is mounted so as to surround the reaction cylinder 3 on the outside of the reaction cylinder 3. The reaction gas containing a reaction product gas is discharged from an exhaust port 17 formed at the lower end of the supporter 14. Accordingly, the generation of wall-deposition to the inner wall of a reaction chamber and the outer side surface of the supporter can be inhibited.
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