Amorphous silicon devices and method of producing

摘要

An amorphous silicon material fabricated by a magnetically aligned glow discharge. A junction leg (e.g., electrostatic barrier) can be formed between two adjacent semiconductor layers by forming a first semiconductor layer by glow discharge deposition in the presence of a first magnetic field to form a first layer with a first orientation, and by forming a second semiconductor layer by glow discharge deposition in the presence of a second magnetic field to form a second layer with a second orientation different from the first orientation, with the barrier being formed between the two layers having different orientations.