Carbon film oxidation for free-standing film formation

摘要

A process is disclosed for fabricating a free-standing thin or thick film structure. One embodiment of the process includes the steps of providing a substrate of a first refractory material, forming a layer of carbon on the substrate, and depositing a film of a second refractory material on top of the layer of carbon. This sandwich structure is heated in an oxidizing ambient to cause the oxidation of the carbon layer leaving the second refractory material as a free-standing film.