| 摘要 |
PURPOSE:To enable the formation of a photosensitive film having good light shieldability and stability and the stable formation of a fine pattern with high accuracy by manufacturing a photosensitive compsn. from a specific diazoamino compd., Bronsted acid, resin binder and solvent. CONSTITUTION:The photosensitive compsn. is manufactured from the diazoamino compd. expressed by formula I, the Bronsted acid, binder and solvent. In formula R1, R2 are a hydrogen atom, alkyl group of 1-6C, phenyl group, R3, R4 are hydrogen atom, halogen atom, alkyl group of 1-6C alkoxy group, alkenyl group of 2-6C, Z2, Z3 are a hydrogen atom, alkyl group of 1-6C, phenyl group. At least one kind selected from the group consisting of inorg. acids and org. acids are used for the Bronsted acid. At least one kind selected from the group consisting of water-soluble high-polymer compds. and org. solvent soluble high- polymer compds. are used for the resin binder. |
