发明名称 Memory device with interconnected polysilicon layers and method for making
摘要 A memory device, based upon a field effect transistor having a floating gate is constructed for use in a silicon integrated circuit array of similar memory devices. The memory device includes only two polysilicon layers, a portion of each polysilicon layer being connected to each other through a via hole in an intervening silicon dioxide layer to form the floating gate.
申请公布号 US4706102(A) 申请公布日期 1987.11.10
申请号 US19850795810 申请日期 1985.11.07
申请人 SPRAGUE ELECTRIC COMPANY 发明人 PAN, DAVID S.;SARMA, KANAK C.;HALFACRE, MARK A.;OWENS, ALEXANDER H.;ROSIER, BRIAN K.
分类号 H01L23/532;H01L29/788;(IPC1-7):H01L29/78;G11C11/34;H01L27/02;H01L29/04 主分类号 H01L23/532
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