发明名称 APPARATUS FOR WASHING SEMICONDUCTOR WAFER
摘要 PURPOSE:To obtain a washing apparatus with high filtering accuracy by providing a filter beneath the internal plate of the washing apparatus. CONSTITUTION:Fine particles and so forth are eliminated from pure water introduced from a pipe 4 by a filter 6 and the pure water is spouted out vigorously from small holes 2a of an internal plate 2 to wash off chemicals and overflows from the top. If the internal plate 2 is attached to the filter 6, the same effect can be obtained. With this constitution, a washing apparatus in which a region where microbes which are born and bred in the washing apparatus spread can be minimized and fine particles produced in a valve and so forth can be prevented from being introduced into the washing apparatus can be obtained.
申请公布号 JPS62256437(A) 申请公布日期 1987.11.09
申请号 JP19860100610 申请日期 1986.04.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 KONAKA HIROMI
分类号 B08B3/02;H01L21/304 主分类号 B08B3/02
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