PRODUCTION OF BLANK FOR PHOTOMASK

摘要

PURPOSE:To eliminate the generation of the defects occurring in glass flaws by etching the surface of a glass substrate having ruggedness by a chemical or physical etching method to decrease the ruggedness, then laminating a light shielding layer thereon. CONSTITUTION:The surface of the glass substrate 1 is etched by the chemical or physical etching method, by which the sectional shape of the flaws is rounded and the edge parts of the flaws can be smoothed. The light shielding layer 3 consisting of one or plural layers is then laminated on the glass substrate 1 by which the blank for a photomask is produced. The blank plate for the photomask having no defects by the glass flaws is thereby easily obtd.