发明名称 METHOD AND DEVICE FOR DEVELOPING PHOTOSENSITIVE LITHOGRAPHIC PLATE IMPROVING DEVELOPMENT PROPERTY
摘要 PURPOSE:To prevent a failure in development from occurring at the leading end part of a photosensitive lithorgaphic plate (PS plate) by holding a developer film on the PS plate and developing it in a part of a development period and forming a breadthwise developer pool thicker than the developer film on the surface of the PS plate at the leading end part. CONSTITUTION:When the PS plate 2 is inserted into the entrance of a device, a developer flowing out of plural holes of a developer supply pipe 5 flows down along internal slanting surfaces of two plate materials constituting a developer supply member 6 and is dammed up by a slit nearby the exit at the lower end to form the continuous liquid pool, thereby supplying the developer onto the plate in a uniform liquid film. Then, the developer forms the developer pool 9 thicker than the developer film at the leading end part while flowing on the plate surface in the conveyance direction before the front end of the PS plate 2 abuts on a slanting plate 8, and further, a similar developer pool is formed at the leading end part in part of the period wherein the leading end part of the PS plate 2 moves sliding on the guide surface of the slanting plate 8. The developer is removed behind the position of development completion by a squeeze roller 10, etc., from the PS plate 2 moving beyond the rear end of the slanting late 8 and then enters a next process.
申请公布号 JPS62257171(A) 申请公布日期 1987.11.09
申请号 JP19860101681 申请日期 1986.04.30
申请人 KONIKA CORP 发明人 NAKANO MIEJI;KIYONO MINORU;UEHARA MASABUMI;NOGAMI AKIRA
分类号 G03F7/30;(IPC1-7):G03F7/00;G03F7/00 主分类号 G03F7/30
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