| 摘要 |
PURPOSE:To improve the performance of a surface relief type hologram by executing bias exposing by the incidence of light from the end of a substrate in addition to two-beam interference exposing so that desired characteristic are obtd. by freely controlling the distribution of the quantity of light in a photosensitive agent layer. CONSTITUTION:The photosensitive agent layer 2 on the substrate 1 is subjected to the holographic exposing by the two-beam interference and to the bias exposing by the irradiation of the light L3 at the angle theta satisfying total reflection conditions at the air-photosensitive agent boundary from the end face of the substrate 1. The desired distribution of the quantity of light is obtd. Within the photosensitive agent layer 2 by changing the incident angle theta of the light L3 at the time of executing the bias exposing.
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