发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the titled composition having good coating characteristics such as flexibility by incorporating a specific N-(hydroxyphenyl)-maleimide copolymer, a novolak resin and a quinone azide compd. to the titled composition. CONSTITUTION:(1): The N-(hydroxyphenyl)-maleimide polymer polymerized from constitution units shown by formulas I, II and III wherein R1 is aryl, 1-16C alkyl or cycloalyl group, R2 is hydrogen atom or lower alkyl group, a ratio of (n), (l) and (m) atisfys the following formulas; 0.01<n/(l+m)<=10 and 0.1<l(l+m)<=1. (2): The novolak resin is used for one component of the titled composition. (3): The quinone azide compd. as the photosensitve agent is exemplified by for example, naphthoquinone diazide sulfonic acid ester and benzoquinone diazide sulfonic acid ester, etc. The titled composition isobtd. by incorporating the compds. (1), (2) and (3). Thus, the titled composition capable of forming a coatings having a good flexibility and a high fine pattern, and having good sticking property against a substrate and an excellent heat-resisting property is obtd.
申请公布号 JPS62255937(A) 申请公布日期 1987.11.07
申请号 JP19860099740 申请日期 1986.04.30
申请人 UBE IND LTD 发明人 TSUJIMOTO NOBUHIRO;HIROMOTO JIRO
分类号 G03C1/72;G03F7/012 主分类号 G03C1/72
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