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发明名称
POSITIVE PHOTORESIST COMPOSITIONS
摘要
申请公布号
EP0200129(A3)
申请公布日期
1987.11.04
申请号
EP19860105450
申请日期
1986.04.19
申请人
MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
发明人
MERREM, HANS JOACHIM, DR.
分类号
G03F7/022;G03F7/09;(IPC1-7):G03F7/08;G03F7/02
主分类号
G03F7/022
代理机构
代理人
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