| 摘要 |
PURPOSE:To support a wafer of any size without losing flatness by providing a wafer supporting base having a flat part of an area larger than that of a screen to be transferred by one process and smaller than the size of wafer to be used, and a wafer moving mechanism. CONSTITUTION:A flat part of an area larger than the size of a screen to be transferred by one process and smaller than the size of wafer to be used is provided at the end of a wafer supporting base 7. A part to be exposed of a wafer 4 is sucked by using a vacuum to the base 7, and exposed by an illumination optical system 1 and an optical system 3 for contraction projection. After this exposure is finished, the vacuum of the base 7 is released, the rear of the wafer 4 is sucked by using a vacuum by means of the wafer moving arm 9 of a wafer moving mechanism 8 to move the part to be exposed next to the wafer 4 to the flat part of the base 7, which is sucked by using a vacuum and then exposed. Thus, a pattern of a photomask 2 is transferred to the whole surface of the wafer 4. |
