| 摘要 |
PURPOSE:To generate uniform plasma discharge by providing annular cathode and anode members so as to insulate the same from each other in a closed magnetic field as discharge electrodes in a sputtering device, connecting discharge power sources to the respective electrode members and independently controlling the discharge electric powers of the electrode members. CONSTITUTION:Magnets 3 are concentrically provided via insulating plates 2 atop a target support 1 of the sputtering device and the targets 4 are attached atop the same. The anodes 5 are disposed therebetween. Each magnet 3 is fixed with two pieces of magnetic materials 6 consisting of iron, etc., facing each other by means of nonmagnetic materials 7 consisting of a stainless steel, etc., is fixed with a magnet 8 at the bottom end of each magnetic material and is attached with the target 4 to the top end. The respectively independent discharge power sources 9 are connected to the respective magnets 3 and materials to be disposed are installed to the positions where the materials face the targets 4. Plasma is uniformly generated in the part where the electric fields generated by the voltages impressed from the power sources 9 and the magnetic fields by the magnets 3 intersect orthogonally with each other. The target materials are ionized and are uniformly deposited on the materials to be treated.
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