| 摘要 |
A device 10 for both heating a fluid and for cleaning a waste gas comprises a container 14 into which waste gas is introduced through a waste gas inlet. The waste gas is moved through the container 14 by a fan 25. The blades 35 of fan 25 are also used to atomize a liquid directed thereto and to spray the liquid into the waste gas in the container 14. In addition, fan 25 facilitates the recirculation of at least a portion of the waste gas in the container 14 back through the fan 25 for repeated introduction of the waste gas into the container 14. A heat exchanger 11 is disposed in container 14 for transferring heat between the waste gas in the chamber and a liquid-to-be-heated. In a preferred embodiment, an insulated funnel 17 comprises an inlet for the waste gas. Means are provided for introducing liquid tangentially into the funnel 17 for forming a liquid layer to cover and inner surface of the funnel 17, whereby the liquid layer precludes direct contact of the waste gas with the inner surface of the waste gas inlet. |
