| 摘要 |
PURPOSE:To build a high-precision exposure device capable of easily removing distortion from an image without interrupting exposure by a method wherein a compensating means is provided for applying an appropriate mechanical force from a desired direction to a mask pattern for the production of distortion in the mask pattern for the removal of distortion if any from a projected, reduced image. CONSTITUTION:Parallel rays or a laser beam 1 strikes a mask 2, creating an image patterned after in the mask 2. The optical pattern is scaled down in a lens 3 before being projected. When distortion is detected in the projected, reduced image attributable to some characteristics of the lens 3, a compensating means is used, which applies a mechanical force 5 to the mask 2 for distorting the pattern of the mask 2 for the removal of distortion from the projected, reduced image. This results in an image 4 free of distortion and similar to the distortion-free, right pattern of the mask 2 prior to the application of the compensating, mechanical force 5.
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