| 摘要 |
PURPOSE:To form a thin film on a substrate while preventing the deposition of the thin film on an optical window by setting the light intensity on the inside surface of the optical window provided to a thin film forming chamber at the intensity enough to evaporate the thin film sticking to said optical window and introducing the light from said optical window into the thin film forming chamber. CONSTITUTION:The light is introduced through the optical window 22 into the thin film forming chamber (vacuum chamber) 21 and the thin film is formed while a reactive gas or substrate 31 is photoexcited. The light intensity on the inside of the window 22 is maintained substantially higher to evaporate the thin film depositing to the window 22, by which the decrease of incident light is prevented. The light intensity necessary for the evaporation of the thin film is approximately calculated from the wavelength region of the light, the magnitude of the absorption of the thin film in said wavelength region and the temp. necessary for the evaporation of the thin film. Whether the light is pulse light or continuous light is an important parameter as well. These parameters are easily obtd. from a physical property constant chart, etc.
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