发明名称 CRUCIBLE TYPE VAPOR DEPOSITION SOURCE
摘要 PURPOSE:To improve coating efficiency by passing a material for vapor deposition evaporated with a crucible heating means through a hole pierced in a crucible cover so as to narrow the dispersion direction. CONSTITUTION:A material 2 for vapor deposition is put in a crucible 11 and evaporated by heating with a heating means 12. The molecules of the resulting vapor pass through a hole 18 pierced in the central part of a crucible cover 14 and diffuse. At this time, the cover 14 is heated with a cover heating means 16 so as to prevent the sticking of the molecules to the cover 14. Thus, the flow of the molecules is made uniform and the vapor deposition direction is narrowed to concentrate the molecules on a body on which vapor is deposited.
申请公布号 JPS62247065(A) 申请公布日期 1987.10.28
申请号 JP19860090590 申请日期 1986.04.18
申请人 SUMITOMO ELECTRIC IND LTD 发明人 TAKAHASHI KENICHI;ASHIDA NORIYUKI
分类号 C23C14/26 主分类号 C23C14/26
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