发明名称 Method of manufacturing a semiconductor device.
摘要 <p>A semiconductor device comprising a circuit element having a first (9) and a second (14) electrode zone of opposite conductivity types, the dopant for the second electrode zone (14) being provided in the semiconductor body (1) via an opening (12) in a masking layer (11), the opening (12) then being reduced by providing edge portions (17) (16) of passivating material, and the second electrode zone (14) is connected to a conductive layer (22), which extends across the layer (11) and the edge portions (17) (16) into the opening of reduced size. The contact opening of reduced size can be derived from the doping opening (12) without taking into account an alignment tolerance. Preferably, the layer (11) comprises a pattern of electrically conducting material having a closed geometry, which pattern surrounds the opening (12) entirely.</p>
申请公布号 EP0242893(A1) 申请公布日期 1987.10.28
申请号 EP19870200371 申请日期 1987.03.02
申请人 N.V. PHILIPS' GLOEILAMPENFABRIEKEN 发明人 JOSQUIN, WILHELMUS J.M.J.
分类号 H01L21/336;H01L29/78;H01L29/73;H01L21/033;H01L21/331 主分类号 H01L21/336
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