发明名称 Selective and continuous removal of metal-ion contaminants from plating baths
摘要 A method is disclosed for the selective removal of metal ions from plating solutions comprising contacting the plating solutions with liquid organic complexing agents such as oximes or phosphoric acid esters or microporous material, preferably anisotropic, the microporous material being impregnated with such substances. The microporous material may be in various forms, including beads, fibers, sheets and gels. Copper, zinc and iron contaminants are effectively removed from nickel-plating solutions.
申请公布号 US4702838(A) 申请公布日期 1987.10.27
申请号 US19840642419 申请日期 1984.08.20
申请人 BEND RESEARCH, INC. 发明人 BABCOCK, WALTER C.;FRIESEN, DWAYNE T.
分类号 C02F1/42;C09K3/00;C25D21/18;(IPC1-7):B01D15/04 主分类号 C02F1/42
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