摘要 |
PURPOSE:To attain the resistance to organic solvent and to attain frequency adjustment by using a specific resin and varying the formed film thickness so as to form simply the thin film thereby reducing the propagation loss and conversion loss by the thin film forming. CONSTITUTION:A resin selected among resins comprising polybenzoimidazol group resin, polybenzoxazinone rein, polyquinaizorinedione resin, polyamide resin, polysulfonic resin, poly P xylene resin, fluororesine, polyester resin, vinyl resin and phenolic resin is used as the thin film and the frequency is adjusted by chaning the film thickness formed. In applying a specific diluting agent to a specific resin to adjust the viscosity, the thin film is formed simply by using, e.g., spray. In using a proper mask, the thin film is easily formed selectively only at a desired part requiring the frequency adjustment for the surface wave device.
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