| 摘要 |
A readily removable coating of silicon is deposited from a gaseous compound thereof on to a carrier having a coating of silica or tantalum oxide. A coating of silica may be deposited from mono-, di-, or trichlorosilane, or silicon tetrachloride. Deposition may result from hydrolysis, e.g. two streams of argon hydrogen, helium, or nitrogen containing respectively a silicon compound and vaporized water having a resistivity of greater than 10 megohms may be interacted; or from burning a mixture of hydrogen and a silicon compound. A coating of tantalum oxide may be deposited from tantalum pentachloride. A silica coating produced by hydrolysis may be heated to a temperature of 800 DEG -1000 DEG C. The carrier may be of silica, tungsten, molybdenum, tantalum, or niobium. The silicon coating may be formed as a rod on a wire or inside a tube. After removal from a wire a silicon rod may be treated with hydrofluoric acid and zone refined. Examples are given.ALSO:A readily removable coating of silicon is deposited from a gaseous compound thereof on to a carrier having a coating of silica or tantalum oxide. A coating of silica may be deposited from mono-, di-, or tri-chlorosilane, or silicon tetrachloride. Deposition may result from hydrolysis, e.g. two streams of argon, hydrogen, helium, or nitrogen containing respectively a silicon compound and vaporized water having a resistivity of greater than 10 megohms may be interacted; or from burning a mixture of hydrogen and a silicon compound. A coating of tantalum oxide may be deposited from tantalum pentachloride. A silica coating produced by hydrolysis may be heated to a temperature of 800-1000 DEG C. The carrier may be of silica, tungsten, molybdenum, tantalum or niobium. The silicon coating may be formed as a rod on a wire or inside a tube. After removal from a wire a silicon rod may be treated with hydrofluoric acid and zone refined. Examples are given. |
