| 摘要 |
<p>PURPOSE:To form the titled device into a large size without spoiling the display characteristic thereof by forming a nonlinear element into the structure consisting in providing a thick insulator to the upper part of the 1st metallic electrode and a thin insulator to the side faces and forming the side face parts of the electrode to a tapered shape at a specific angle. CONSTITUTION:The MIM element is made into the structure consisting in providing the thick insulator to the upper part of the 1st metallic electrode and the thin insulator to the side faces thereof. The side face parts of the metallic electrode is formed to <=35 deg. tapered shape. Ta is formed to glass 1 and is thermally oxidized in an oxygen atmosphere to form thermally oxidized Ta2O5 2. After Ta 3 is formed by DC sputtering, the surface is anodized in an aq. citric acid soln. to form Ta2O5 4. Dry etching is then executed by using a gaseous mixture composed of CF4 and O2 to form the section of the Ta2O5 4 and Ta 3 to the tapered shape. Anodically oxidized Ta2O5 is formed to the side face parts of the Ta 3 exposed by dry etching and thereafter the two-layered thin films of Cr 5 and ITO 6 are formed.</p> |
