| 摘要 |
PURPOSE:To enable development to be stopped when development proceeds just to the appropriate point, fog due to overdevelopment to be prevented, and constant photographic performance to be obtained even when heating temperature randomly varies by heating a heat-developable photosensitive material in the presence of a specified compound. CONSTITUTION:The heat-developable photosensitive material is heated in the presence of one of the compounds represented by formula I in which n is 1 or 2; when n is 1, R<1> is alkyl or the like, when n is 2, it is phenylene or the like; R<2> is >=3C alkyl or the like; and -(L)- is a single bond for only linking both adjacent groups, -O-, or the like. This compound is characterized by the fact that the development inhibitor to be released has the group of -(L)-R<2>, thus permitting development inhibition to be realized in this heat-developable photosensitive material only by the presence of this group. It is most preferable for the heat-developable photosensitive material to use silver halide as a photosensitive body, and it is preferred to adjust the heating temperature to 50-250 deg.C, especially, 60-180 deg.C. |
