发明名称 SUBSTRATE HEATING DEVICE FOR MOLECULAR BEAM EPITAXY APPARATUS
摘要 PURPOSE:To make the temperature distribution in a substrate uniform, by using a heater part facing the central part of the substrate as a supporting part, and providing a heating plate between the heater part and the substrate. CONSTITUTION:A substrate 1 is fixed to a substrate holder 2 with a substrate pushing part 3. A heater 4 is attached to a heater base 5 and arranged so as to face the substrate 1. A heating plate 6 is provided between the substrate 1 and the heater 4 and attached to an insulator 8 of a thermocouple 7, which is provided so as to face the central part of the substrate. Heat dissipation by heat conduction of the heating plate 6 is made only through the insulator 8. The temperature distribution of the heating plate 6 tends to be high at the peripheral part and low at the central part. The temperature distribution in the substrate 1 becomes lower since the heat is dissipated from the peripheral part of the substrate 1 to the holder 2. Therefore, the temperature distribution of the substrate offsets the temperature distribution in the heating plate 6. Thus the temperature distribution in the substrate 1 becomes uniform.
申请公布号 JPS62245622(A) 申请公布日期 1987.10.26
申请号 JP19860087977 申请日期 1986.04.18
申请人 HITACHI LTD 发明人 TAKAHASHI NUSHITO;KAJI RYOKICHI;TAMURA NAOYUKI
分类号 H01L21/203;H01L21/26 主分类号 H01L21/203
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