| 摘要 |
PURPOSE:To evaluate uniformity of treatment quickly, by providing an optical system having an optical axis, which is inclined with respect to the surface of a sample, providing an optical sensor, which is inclined with respect to said optical axis, and detecting the change in image of the entire surface of a sample by the specified treatment of the sample. CONSTITUTION:The inside of a treating chamber 1 is evacuated through an exhausting port 6 to a specified vacuum degree. High frequency power is applied between a lower electrode 2 and an upper electrode 3. Reacting gas having a specified composition is supplied into a treating chamber 1 through a reacting- gas feeding port 5. Then the gas is transformed into plasma by the high frequency power. A thin film formed on the surface of a sample 4, which is mounted on the sample 4, is etched. An optical system 7 has an optical axis with respect to the surface of the sample 4. The transmitting wavelength of an interference filter 7c of the optical system 7 is suitably selected. Then, the distribution of the interference fringes in a specified color on the entire surface of the sample 4 is observed by an image processing part 8b through a secondary sensor 8. Based on the distribution of the changing interference fringes, the uniformity of etching at each part of the sample 4 is quickly evaluated.
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