| 摘要 |
PURPOSE:To form a uniform film on the surface of a static substrate at a high speed by forming a microwave introducing space between a substrate and porous metallic cylinder, and introducing gas through the holes of the cylinder into the space so that an active seed is made to arrive at the substrate surface before attenuation. CONSTITUTION:The porous metallic cylinder 4 formed on the inside of a metallic vessel 3 is connected to a waveguide 1 of a microwave transmitting means. The photosensitive drum substrate 5 is put on a supported 6 disposed to the inside of the cylinder 4 and is thus supported. The microwaves are introduced through the waveguide 1 into the space between the substrate 5 and the cylinder 4 in the axial direction and the gas is introduced from a piping 8 into the space between the metallic vessel 3 and the cylinder 4. The gas is admitted through the holes of the cylinder 4 into the cylinder 4 and the microwave plasma is generated in the space between the substrate 5 and the cylinder 4 by the effect of the microwaves. The active species generated in the plasma acts on the substrate 5, thus growing an amorphous silicon film, etc., thereon. |
