| 摘要 |
PURPOSE:To prevent a decrease in the yield of the product by providing the electrode part for electric discharge cleaning which can be inserted in and drawn out in the chamber for treating a sample under reduced pressure, and allowing the electrode part to recede from the treating chamber through a gate value at the time of treating the sample. CONSTITUTION:The sample is charged into the heating chamber 10 provided with a roughing vacuum pump 61 and a high-vacuum pump 64 through a load block chamber 40 connected to a gaseous N2 source 71. A target 21 arranged at a sputter electrode part 20 is sputtered to from a film on the surface of the sample. When the inside of the treating chamber 10 is to be cleaned by discharge, the gate valve 52 connected to the treating chamber 10 is opened, and a partition plate 80 is lowered to extrude the electrode part 83 for discharge cleaning contained in the space 81 in a bellows 82 furnished between the gate valve 52 and the partition plate 80 into the treating chamber 10. The electrode part 83 is then energized by an electric power source 90, a bias voltage is further impressed on the inner wall of the treating chamber 10, and cleaning is performed. After discharge cleaning, the electrode part 83 is allowed to recede into the space 81, the gate valve 52 is closed, and sputtering is resumed. |
