发明名称 MICROWAVE PLASMA GENERATOR
摘要 PURPOSE:To form a uniform film on the surface of a static substrate at a high speed by introducing gas into the microwave introducing space between the substrate and porous cylinder through the holes of the cylinder and acting a magnetic field so that an active species is made to arrive at the substrate surface before attenuation. CONSTITUTION:The porous metallic cylinder 34 formed on the inside of a metallic vessel 3 is connected to a waveguide 31. The photosensitive drum substrate 3 is put on a support 36 disposed to the cylinder 34 and is thus supported. The microwaves are introduced through the waveguide 31 into the space between the substrate 35 and the cylinder 34 and the gas is introduced from a piping 38 into the space between the vessel 33 and the cylinder 34. The gas is admitted through the holes of the cylinder 34 into the cylinder 34 and the microwave plasma is generated in the space between the substrate 35 and the cylinder 34 by the effect of the microwaves. Magnetic lines of force penetrating the cylinder 34 in the radial direction are generated by a means for generating magnetic lines of force such as solenoid 40 disposed to the outside periphery of the vessel 33. The plasma arrives at the surface of the substrate 35 along such magnetic lines of force and an amorphous silicon film or the like is formed on the substrate.
申请公布号 JPS62243774(A) 申请公布日期 1987.10.24
申请号 JP19860086874 申请日期 1986.04.15
申请人 FUJI ELECTRIC CO LTD 发明人 NAGAO YASUAKI
分类号 H01L21/205;C23C16/24;C23C16/50;C23C16/511;G03G5/08;G03G5/082 主分类号 H01L21/205
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