| 摘要 |
PURPOSE:To perform accurate electron beam lithography on a sample, by using a cassette provided with a part to be detected, which can be specified by a detecting device, and readily specifying the desired cassette even if a plurality of the cassettes are used. CONSTITUTION:A plurality of cassettes 8, in which mask blank parts 14 are provided, are prepared. The cassettes are housed in a loading chamber 2. Then the inside of the cahmber 2 undergoes deairing, and the pressure is reduced to obtain the desired degree of vacuum. Thereafter, a vacuum valve 4 between a sample chamber 1 and the chamber 2, in which the desired vacuum degree is obtained, is opened. The cassettes 8 are set at specified positions on an X-Y stage 7. Then the valve 4 is closed. When the cassettes 8 are set, the cassettes are automatically specified from the position of a light shielding plate 8a. The information is transferred to a correcting part 12. Then, the correcting part 12 retrieves the information, which corrects the position caused by the cassettes 8, out of the already inputted information. The information is sent to a control part 11. In the control part 11, correction is applied to the driving information of the X-Y stage, which is inputted beforehand, and a driving part 6 is operated.
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