发明名称 MEASURING INSTRUMENT FOR FAR FIELD PATTERN
摘要 PURPOSE:To measure far field patterns (FFP) of plural LDs in a short time by providing an LD mount, a rail a photodetector, etc. CONSTITUTION:The LD mount 2 is replaceable from a fixed base 3 and LDs 10 are mounted in an array at equal intervals. Further, the rail 4 is provided on the base 3a and its center 0 corresponds to the LDs 10. The photodetector 5 is fitted to the rail 4 so that its photodetection surface 5a is in the center direction on the rail 4. The photodetector 5 is movable by a driving means 6 arcuately on the rail 4. The rail 4 is rotatably by specific angle through a rotating means 7. Namely, the rail 4 is rotated by, for example, 90 deg. above the surface of an LD 10 to measure the FFP of the LD 10 in a short time. Further, the means 7 is movable by a moving means 8 at pitch intervals of the LDs 10 on the mount 2, and the FFPs of the LDs 10 are measured continuously.
申请公布号 JPS62242833(A) 申请公布日期 1987.10.23
申请号 JP19860086054 申请日期 1986.04.16
申请人 ANRITSU CORP 发明人 MIYAO HIDETOSHI;ARAKI YUKIO;KAMEI HISAAKI
分类号 G01J1/00;G01J1/42;G01M11/00 主分类号 G01J1/00
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