| 摘要 |
PURPOSE:To enhance sensitivity and to improve resistance to plasma treatment by incorporating a specified siloxane polymer and a polymer containing specified repeating units. CONSTITUTION:The siloxane polymer is represented by formula I in which each of R1-R3 is H, alkyl, or the like; each of l-n is 0 or a positive integer, and both are not simultaneously 0; X is R-(C=O)- or R-(CHOH)-; and R is an optionally substituted hydrocarbon. The polymer of formula I is obtained by subjecting a cyclic phenylsiloxane, such as hexaphenyl-cyclotrisiloxane, with alkali metal hydroxide or alkali metal alkoxide to ring-opening polymerization, and modifying the obtained polydiphenylsiloxane. The second polymer contains the repeating units each represented by formula II in which R4 is H, alkyl, or phenyl; Y is alkyl or alkylsilyl; Z is -(RO2)- or -O-(CO)-O-; and p is O or a positive integer. The resist material comprises these two kinds of polymers, thus permitting a pattern high in aspect ratio and resistance to dry etching using CF4 or the like to be obtained with high sensitivity. |
