| 摘要 |
PURPOSE:To solve the problem of the attachment of foreign materials, by providing openings for ejecting gas defined in the surface confronting the lower surface of a holding member and a means for moving the holding member. CONSTITUTION:A wafer 16 is place on a holding member 10 downwardly from its upper portion. The gas ejected from gas ejecting ports 14 defined in the holding member 10 flows along the lower circumferential portion of the wafer 16 and its side and a gas layer is portion of the wafer 16 and its side and a gas layer is formed between the wafer 16 and vertical surface portions 10A, 10B and horizontal surface portions 10C, 10D. As a result, the wafer 16 is held by the holding member 10 in a floating condition. Further, since the ejecting ports 14 are arranged at the position corresponding to the circumferential portion of the wafer 16, the wafer 16 is held substantially horizontally.
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