发明名称 MASK FOR SEMICONDUCTOR DEVICE
摘要 PURPOSE:To easily trace the history of a mask process in production without requiring a specific process as a wafer process by forming a mark for identifying a pattern in a specific mask chip area selected and used out of plural masks having different patterns. CONSTITUTION:In a semiconductor production process using 8 kinds of masks, three kinds of versions are prepared in a mask process 3 and one of them is selected and used. In a mask process 7, two kinds of versions are prepared and one of them is selected and used. Codes 1, 11, 12 for identifying these versions, e.g. 3-1-3-3, 7-1, 7-2, are entered in respective chips of respective masks as patterns. After executing the mask processes 3, 7, the identification codes are formed on the chips. Thereby, the history tracking of the mask processes in the production processes can be easily executed after the completion of an integrated circuit.
申请公布号 JPS62235952(A) 申请公布日期 1987.10.16
申请号 JP19860079143 申请日期 1986.04.08
申请人 AGENCY OF IND SCIENCE & TECHNOL 发明人 NISHIUCHI KOICHI
分类号 G03F1/00;G03F1/38;G03F1/70;G03F1/76;H01L21/02;H01L21/027;H01L21/30 主分类号 G03F1/00
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