| 摘要 |
PURPOSE:To form a film having few pinholes without lowering magnetic characteristics by a method wherein a multilayer film of the prescribed film thickness is obtained by repeatedly performing a film-forming process for a short period in the state wherein a substrate is maintained at the temperature higher than the temperature heretofore in use and another film-forming process in performed at the temperature heretofore in use. CONSTITUTION:After the first layer 2 of about 50 nm in thickness has been formed using iron as a magnetic material maintaining the temperature of a glass substrate 1 at 400 deg.C, and by performing ionplating for three minutes, the temperature of the glass substrate 1 is lowered to 200 deg.C, ion-plating is performed at the same filmforming speed for fifty minutes, and the second layer 3 of about 900 nm in thickness is formed. Subsequently, the temperature of the glass substrate 1 is raised to 400 deg.C again, and the third layer 4 of about 50 nm in thickness is formed at the same film-forming speed. The pinhole generating density of the Fe magnetic film of 1 mum in thickness formed as above is 2 pinholes/cm<2> as against the pinhole generating density of 10-20 pinholes/cm<2> on the film formed at the substrate 1 temperature of 200 deg.C using the method heretofore in use, and the quality of the magnetic film can be improved sharply.
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