发明名称 PATTERN FORMING METHOD
摘要 PURPOSE:To form a pattern having high sensitivity and high resolution by providing a layer contg. a monomolecular film of a polymerizable compd. or the cumulative film thereof via an intermediate layer on a substrate and applying energy to said layer, thereby polymerizing the same to a pattern shape. CONSTITUTION:The layer contg. the monomolecular film 6 of the polymerizable compd. or the cumulative film 8 thereof is provided via the intermediate layer 20 on the substrate 5 and the energy is applied to the layers 6, 8 to polymerize the same to the pattern shape. The polymerizable compd. 1 used here is the compd. having respectively at least one hydrophilic parts 2, hydrophobic parts 3 and polymerizable parts 4 in the molecule. The polymerizable compd. 1 is preferably exemplified by a diacetylene deriv. compd. which is the compd. expressed by R-CidenticalC-CidenticalC-(R1)n-X, where R, R are the hydrophobic part, X is the hydrophilic part and n is 0 or 1.
申请公布号 JPS62232647(A) 申请公布日期 1987.10.13
申请号 JP19860077023 申请日期 1986.04.03
申请人 CANON INC 发明人 TOMITA YOSHINORI;TAKIMOTO KIYOSHI;EGUCHI TAKESHI;SAITO KENJI;MIYAZAKI TOSHIHIKO;KIMURA TOSHIAKI
分类号 G03F7/20;G03C1/74;G03C5/00;G03F7/004;G03F7/025;G03F7/11;G03F7/16;G03F7/26;G03F7/38 主分类号 G03F7/20
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