发明名称 |
Dot-etchable image-containing element useful in lithographic mask formation and its production |
摘要 |
A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.
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申请公布号 |
US4699859(A) |
申请公布日期 |
1987.10.13 |
申请号 |
US19840648095 |
申请日期 |
1984.09.07 |
申请人 |
TOYO BOSEKI KABUSHIKI KAISHA |
发明人 |
FUJIMURA, TOSHIAKI;KATOH, YOSHIO;IMAHASHI, SATOSHI;SETO, KOICHI;TANAKA, SHINICHI |
分类号 |
G03F1/10;(IPC1-7):G03C1/68;G03F7/02 |
主分类号 |
G03F1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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